以甲烷與二氧化碳混合氣體合成鑽石膜之光學性質研究

Abstract

本實驗利用微波電漿化學氣相沈積法，以甲烷與二氧化碳混合氣體為反應 源，探討各種鑽石膜合成條件及光學特性為主要目的。根據實驗結果顯示 ，利用此反應源於300℃低溫下也可能合成高品質的鑽石膜，以及呈現 （100）的表面形態，850℃下合成的鑽石膜表面則為不規則的結晶形態。 無基板狀態（free-standing）鑽石膜的室溫光學特性，經由傅利葉轉換 紅外（FTIR）光譜分析結果顯示，鑽石膜的折射係數可媲美天然鑽石。利 用本實驗室所提倡的二段式成長法，及機械式研磨法均可以顯著地減低鑽 石膜因成長時間顯現的粗糙表面膜的碳氫鍵吸收帶強度較高溫鑽石膜來得 大。另外，從模擬紅外大。鑽石膜的氧化會造成表面非晶質碳膜的形成， 且呈現許多孔洞及縫隙，造成穿透率的降低。 Diamond films were grown on Si(100) subatrate by microwave by microwave plasma-assisted chemical vapor deposition using CH4+ CO2 as a reactive gas.The prime purpose of this thesis was to discuss the deposition condition and diomond optical characterization. The experimental result indicated that we could synthesize a good quality of diamond with (100) facets surface morphology at 300℃ using this gas mizture. However, diamond films deposited at temp woukd show a surface morphology which was consisted of irregular crystallines. Room-temp optical properties of free-standing diamond films were studied by Foruier transform infrared spectroscopy. The results indicated that the refractive index of diamond films were comparable to that of natural diamond.