噴濺之蒙地卡羅模擬

Abstract

吾人發展完成一種蒙地卡羅模擬程式, 可以用來決定元素靶在物理噴濺過 程中之濺射率以及噴濺粒子的能量和角度分佈. 由檢視原子的交互作用位 能和非彈性能量損失以及表面束縛能對濺射率之影響而確定程式之輸入物 理參數. 我們主要討論濺射率對入射離子能量和角度的模擬結果. 此外, 我們亦討論噴濺粒子的總能量和角度分佈以及非垂直入射下特定立體角之 角度分佈. 模擬計算的數值儘可能與實驗結果比較, 吾人確實可以獲得良 好的一致性. A Monte Carlo simulation program has been developed to determine sputtering yields of single-element targets as well as energy and angular distributions of sputtered particles in physical sputtering processes. By examining the influence of the interatomic potential and the inelastic energy loss as well as as the surface binding energy on the sputtering yields, the input physical parameters are determined. Simulated results of sputtering yields versus incident ion energy and angle are discussed. Futher results are total angular and energy distributions of sputtered particles and angular distributions in specified solid angles for non-normal incidence. The calculated data are compared with experimental results as far as possible and good agreement has been obtained.