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dc.contributor.authorChin, Aen_US
dc.contributor.authorLiao, CCen_US
dc.contributor.authorChu, Jen_US
dc.contributor.authorLi, SSen_US
dc.date.accessioned2014-12-08T15:01:48Z-
dc.date.available2014-12-08T15:01:48Z-
dc.date.issued1997-05-01en_US
dc.identifier.issn0022-0248en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0022-0248(96)00922-0en_US
dc.identifier.urihttp://hdl.handle.net/11536/569-
dc.description.abstractWe have studied two Si-doped p-type quantum well infrared photodetectors (QWIPs) using AlGaAs/GaAs and AlGaAs/InGaAs grown on (3 1 1)A GaAs. The Si-doped AlGaAs/GaAs p-QWIP exhibits a symmetrical dark I-V characteristic at all the measured temperatures from 40 to 120 K. The strained p-type AlGaAs/InGaAs QWIP exhibits a slightly asymmetrical dark I-V characteristic, but is markedly less asymmetrical than that doped with beryllium. The slight asymmetry in dark I-V characteristic and the large blue-shift in responsivity spectra may be due to the thickness modulation observed from TEM and the red-shift of PL peak energy, where PL peak energies from (3 1 1)A AlGaAs/InGaAs multiple quantum wells are red-shifts of 7 and 22 meV to the side-by-side grown (1 0 0).en_US
dc.language.isoen_USen_US
dc.titleInvestigation of Si-doped p-type AlGaAs/GaAs, AlGaAs/InGaAs quantum well infrared photodetectors and multiquantum wells grown on (311)A GaAsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/S0022-0248(96)00922-0en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.citation.volume175en_US
dc.citation.issueen_US
dc.citation.spage999en_US
dc.citation.epage1003en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1997XX17900057-
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