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dc.contributor.authorHuang, Yung-Lungen_US
dc.contributor.authorChiu, Shao-Pinen_US
dc.contributor.authorZhu, Zhi-Xinen_US
dc.contributor.authorLi, Zhi-Qingen_US
dc.contributor.authorLin, Juhn-Jongen_US
dc.date.accessioned2014-12-08T15:07:15Z-
dc.date.available2014-12-08T15:07:15Z-
dc.date.issued2010-03-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3357376en_US
dc.identifier.urihttp://hdl.handle.net/11536/5721-
dc.description.abstractWe have fabricated oxygen deficient polycrystalline ZnO films by the rf sputtering deposition method. To systematically investigate the charge transport mechanisms in these samples, the electrical resistivities have been measured over a wide range of temperature from 300 K down to liquid-helium temperatures. We found that below about 100 K, the variable-range-hopping (VRH) conduction processes govern the charge transport properties. In particular, the Mott VRH conduction process dominates at higher temperatures, while crossing over to the Efros-Shklovskii (ES) VRH conduction process at lower temperatures. The crossover occurred at temperatures as high as a few tens degrees kelvin. Moreover, the temperature behavior of resistivity over the entire VRH conduction regime from the Mott-type to the ES-type process can be well described by a universal scaling law.en_US
dc.language.isoen_USen_US
dc.subjectelectrical resistivityen_US
dc.subjecthopping conductionen_US
dc.subjectII-VI semiconductorsen_US
dc.subjectsemiconductor thin filmsen_US
dc.subjectsputtered coatingsen_US
dc.subjectwide band gap semiconductorsen_US
dc.subjectzinc compoundsen_US
dc.titleVariable-range-hopping conduction processes in oxygen deficient polycrystalline ZnO filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3357376en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume107en_US
dc.citation.issue6en_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.identifier.wosnumberWOS:000276210800060-
dc.citation.woscount19-
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