Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Huang, Yung-Lung | en_US |
dc.contributor.author | Chiu, Shao-Pin | en_US |
dc.contributor.author | Zhu, Zhi-Xin | en_US |
dc.contributor.author | Li, Zhi-Qing | en_US |
dc.contributor.author | Lin, Juhn-Jong | en_US |
dc.date.accessioned | 2014-12-08T15:07:15Z | - |
dc.date.available | 2014-12-08T15:07:15Z | - |
dc.date.issued | 2010-03-15 | en_US |
dc.identifier.issn | 0021-8979 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.3357376 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/5721 | - |
dc.description.abstract | We have fabricated oxygen deficient polycrystalline ZnO films by the rf sputtering deposition method. To systematically investigate the charge transport mechanisms in these samples, the electrical resistivities have been measured over a wide range of temperature from 300 K down to liquid-helium temperatures. We found that below about 100 K, the variable-range-hopping (VRH) conduction processes govern the charge transport properties. In particular, the Mott VRH conduction process dominates at higher temperatures, while crossing over to the Efros-Shklovskii (ES) VRH conduction process at lower temperatures. The crossover occurred at temperatures as high as a few tens degrees kelvin. Moreover, the temperature behavior of resistivity over the entire VRH conduction regime from the Mott-type to the ES-type process can be well described by a universal scaling law. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | electrical resistivity | en_US |
dc.subject | hopping conduction | en_US |
dc.subject | II-VI semiconductors | en_US |
dc.subject | semiconductor thin films | en_US |
dc.subject | sputtered coatings | en_US |
dc.subject | wide band gap semiconductors | en_US |
dc.subject | zinc compounds | en_US |
dc.title | Variable-range-hopping conduction processes in oxygen deficient polycrystalline ZnO films | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.3357376 | en_US |
dc.identifier.journal | JOURNAL OF APPLIED PHYSICS | en_US |
dc.citation.volume | 107 | en_US |
dc.citation.issue | 6 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | 物理研究所 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.contributor.department | Institute of Physics | en_US |
dc.identifier.wosnumber | WOS:000276210800060 | - |
dc.citation.woscount | 19 | - |
Appears in Collections: | Articles |
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