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dc.contributor.authorHuang, G. S.en_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorYao, H. H.en_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorWang, S. C.en_US
dc.contributor.authorSun, Gregen_US
dc.contributor.authorLin, Chih-weien_US
dc.contributor.authorChang, Lien_US
dc.contributor.authorSoref, Richard A.en_US
dc.date.accessioned2014-12-08T15:07:22Z-
dc.date.available2014-12-08T15:07:22Z-
dc.date.issued2007-01-01en_US
dc.identifier.issn0022-0248en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jcrysgro.2006.10.106en_US
dc.identifier.urihttp://hdl.handle.net/11536/5802-
dc.description.abstractThe GaN/AlGaN active regions for terahertz (THz) quantum cascade lasers were grown by metal organic chemical vapor deposition (MOCVD). The surface of the sample was characterized by atomic force microscopy (AFM). The structure of this sample was evaluated by X-ray diffraction (XRD) and transmission electron microscopy (TEM). The XRD pattern and cross-sectional TEM images showed that a well-controlled quantum cascade GaN/AlGaN layers could be prepared. Optical properties of the active region of a terahertz GaN/AlGaN have been investigated by Fourier transform infrared (FTIR) spectrometer. It was found that the frequency of E-1(LO) phonon decreased in quantum cascade GaN/AlGaN structures. The phonon frequency shift could be attributed to the effect of phonon zone folding. (c) 2006 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectX-ray diffractionen_US
dc.subjectmetal organic chemical vapor depositionen_US
dc.subjectnitridesen_US
dc.titleGaN/AlGaN active regions for terahertz quantum cascade lasers grown by low-pressure metal organic vapor depositionen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.jcrysgro.2006.10.106en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.citation.volume298en_US
dc.citation.issueen_US
dc.citation.spage687en_US
dc.citation.epage690en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000244622600160-
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