電漿輔助化學氣相沈積低溫絕緣層之特性研究及其在薄膜電晶體上之應用

Full metadata record

DC Field	Value	Language
dc.contributor.author	謝守偉	en_US
dc.contributor.author	Xie, Shou Wei	en_US
dc.contributor.author	張俊彥	en_US
dc.contributor.author	Zhang, Jun Yan	en_US
dc.date.accessioned	2014-12-12T02:12:49Z	-
dc.date.available	2014-12-12T02:12:49Z	-
dc.date.issued	1993	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT822430025	en_US
dc.identifier.uri	http://hdl.handle.net/11536/58539	-
dc.language.iso	en_US	en_US
dc.title	電漿輔助化學氣相沈積低溫絕緣層之特性研究及其在薄膜電晶體上之應用	zh_TW
dc.title	Characteristics of plasma-enhanced chemical vapor deposited low-temperature insulating films and their applications to thin-film transistors	en_US
dc.type	Thesis	en_US
dc.contributor.department	電子研究所	zh_TW
Appears in Collections:	Thesis