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dc.contributor.author謝守偉en_US
dc.contributor.authorXie, Shou Weien_US
dc.contributor.author張俊彥en_US
dc.contributor.authorZhang, Jun Yanen_US
dc.date.accessioned2014-12-12T02:12:49Z-
dc.date.available2014-12-12T02:12:49Z-
dc.date.issued1993en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT822430025en_US
dc.identifier.urihttp://hdl.handle.net/11536/58539-
dc.language.isoen_USen_US
dc.title電漿輔助化學氣相沈積低溫絕緣層之特性研究及其在薄膜電晶體上之應用zh_TW
dc.titleCharacteristics of plasma-enhanced chemical vapor deposited low-temperature insulating films and their applications to thin-film transistorsen_US
dc.typeThesisen_US
dc.contributor.department電子研究所zh_TW
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