鍺非晶化與低能量氟化硼離子佈植之研究

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	紀忠良	en_US
dc.contributor.author	Ji, Zhong Liang	en_US
dc.contributor.author	謝宗雍	en_US
dc.contributor.author	Xie, Zong Yong	en_US
dc.date.accessioned	2014-12-12T02:14:11Z	-
dc.date.available	2014-12-12T02:14:11Z	-
dc.date.issued	1994	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT832159006	en_US
dc.identifier.uri	http://hdl.handle.net/11536/59670	-
dc.language.iso	en_US	en_US
dc.title	鍺非晶化與低能量氟化硼離子佈植之研究	zh_TW
dc.title	The investigation of Ge preamorphization and low energy BF2+ implanted Si	en_US
dc.type	Thesis	en_US
dc.contributor.department	材料科學與工程學系	zh_TW
顯示於類別：	畢業論文