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dc.contributor.author林崇杰en_US
dc.contributor.authorLin, Chong Jieen_US
dc.contributor.author白曛綾en_US
dc.contributor.authorBai, Xun Lingen_US
dc.date.accessioned2014-12-12T02:14:23Z-
dc.date.available2014-12-12T02:14:23Z-
dc.date.issued1994en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT832515012en_US
dc.identifier.urihttp://hdl.handle.net/11536/59829-
dc.language.isoen_USen_US
dc.title以GC/FID及GC/ECD同時偵測高科技工業鄰近地區空氣中揮發性有機物背景濃度之研究zh_TW
dc.titleMonitoring study of VOCs concentrations in high-technology industrial area using combined GC-ECD/FID detectorsen_US
dc.typeThesisen_US
dc.contributor.department環境工程系所zh_TW
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