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dc.contributor.authorHsu, C. C.en_US
dc.contributor.authorLin, W. H.en_US
dc.contributor.authorOu, Y. S.en_US
dc.contributor.authorSu, W. B.en_US
dc.contributor.authorChang, C. S.en_US
dc.contributor.authorWu, C. I.en_US
dc.contributor.authorTsong, Tien T.en_US
dc.date.accessioned2014-12-08T15:07:38Z-
dc.date.available2014-12-08T15:07:38Z-
dc.date.issued2010-01-01en_US
dc.identifier.issn0039-6028en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.susc.2009.09.025en_US
dc.identifier.urihttp://hdl.handle.net/11536/6003-
dc.description.abstractThe growth of Pb films on the Si(1 0 0)-2 x 1 surface has been investigated at low temperature using scanning tunneling microscopy Although the orientation of the substrate is (1 0 0), flat-top Pb islands with (1 1 1) surface can be observed The island thickness is confined within four to nine atomic layers at low coverage Among these islands. those with a thickness of six layers are most abundant Quantum-well states in Pb(1 1 1) islands of different thickness are acquired by scanning tunneling spectioscopy. They are found to be identical to those taken oil the Pb(1 1 1) islands grown oil the Si(1 1 1)7 x 7 surface. Besides Pb(1 1 1) islands. two additional types of Pb islands are formed. rectangular flat-top Pb(1 0 0) islands and rectangular three-dimensional (3D) Pb islands, and both their orientations rotate by 90 degrees from a terrace to the adjacent one This phenomenon implies that the structures of Pb(1 0 0) and 3D islands are influenced by the Si(1 0 0)-2 x 1 substrate (C) 2009 Elsevier B.V. All rights reserveden_US
dc.language.isoen_USen_US
dc.subjectPb(100) thin filmen_US
dc.subjectPb(111) thin filmen_US
dc.subjectSi(111) surfaceen_US
dc.subjectElectronic confinementen_US
dc.subjectLow-temperature growthen_US
dc.subjectSTMen_US
dc.titleEffects of electronic confinement and substrate on the low-temperature growth of Pb islands on Si(100)-2 x 1 surfacesen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.susc.2009.09.025en_US
dc.identifier.journalSURFACE SCIENCEen_US
dc.citation.volume604en_US
dc.citation.issue1en_US
dc.citation.spage1en_US
dc.citation.epage5en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000272917500001-
dc.citation.woscount2-
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