高溫度係數熱敏阻薄膜之製作與特性探討

Abstract

本論文的研究重點在於高溫度係數熱敏阻薄膜之製作. 由本實驗的量 測結果顯示, 在室溫(300K)下, 薄膜最佳的TCR可高達-4.21%/oC與其他的 研究結果相近, 利用此薄膜做成的熱輻射偵測器將可大幅提高元件的靈敏 度. 另外, 文中亦將仔細地探討非晶鍺薄膜的諸多特性. The key point of my research is the fabrication of high temperature-coefficient-resistance(TCR) film. From the data of my research, it is shownthat the optimal TCR can be reached to -4.21%/C at ambient temperature(300K),which is close to teh other research. By use of this kind of film, we can greatly improve the performance of bolometer devices. Neverless, in my paper,many properties of amorphous germanium are investigated in details.