電漿輔助化學氣相沉積之介電質在化學機械研磨中特性與製程整合之研究

Full metadata record

DC Field	Value	Language
dc.contributor.author	林啟發	en_US
dc.contributor.author	Lin, Chi-Fa	en_US
dc.contributor.author	馮明憲	en_US
dc.contributor.author	Ming-Shiann Feng	en_US
dc.date.accessioned	2014-12-12T02:14:49Z	-
dc.date.available	2014-12-12T02:14:49Z	-
dc.date.issued	1995	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT840159012	en_US
dc.identifier.uri	http://hdl.handle.net/11536/60187	-
dc.language.iso	zh_TW	en_US
dc.subject	電漿輔助化學氣相沉積	zh_TW
dc.subject	介電質	zh_TW
dc.subject	化學機械研磨	zh_TW
dc.subject	PECVD	en_US
dc.subject	Dielectric	en_US
dc.subject	CMP	en_US
dc.title	電漿輔助化學氣相沉積之介電質在化學機械研磨中特性與製程整合之研究	zh_TW
dc.title	Chemical Mechanical Polishing of PECVD Dielectrics: Characterization and Process Integration	en_US
dc.type	Thesis	en_US
dc.contributor.department	材料科學與工程學系	zh_TW
Appears in Collections:	Thesis