Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 吳世全 | en_US |
dc.contributor.author | Wu ,Shich-Chuan | en_US |
dc.contributor.author | 曾俊元 | en_US |
dc.contributor.author | Tseung-Yuen Tseng | en_US |
dc.date.accessioned | 2014-12-12T02:15:41Z | - |
dc.date.available | 2014-12-12T02:15:41Z | - |
dc.date.issued | 1995 | en_US |
dc.identifier.uri | http://140.113.39.130/cdrfb3/record/nctu/#NT840430129 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/60739 | - |
dc.description.abstract | 本論文從高溫超導體材及濺鍍靶材的研製,至直流與交流濺鍍法薄膜的成 長,和條件控制下各項物理特性的量測分析,到微波元件的製作與工作性 能的探討.如此,經由每階段的整理和分析,除可歸納一濺鍍生長參數的 經驗式外,且能完整了解高溫超導材料的研製程序與元件性能的相關性, 進而提昇實際應用上之可能性,隨之比較直流濺鍍與交流濺鍍方法在超導 薄模生長的異同及了解濺鍍時, 基板與鈀材相對位置改變下,所可能造成 的影響,進而了解濺鍍原子在離開靶材後因其質量化性不同時所可能濺射 的途徑,裨以更清楚薄膜生長的機制,及滿足較佳性質元件研製的可能性 下,所須膜材的最佳生長方法及條件選擇,以提高其實用性 , 並借由其微 波特性量測評估薄膜品質及材料特性. This reasearch is to investigate the fabrication and properties of the high-Tc superconductors which include preparation of bulk material of high-Tc superconductors, DC & RF sputtering growth of thin films, understanding of the growth mechanism in sputtering processre, deriving an empirical formula of sputtering growth, characterization of the microwave properties, then to find the relationship between the quality of devices and the surface morphology. At last, practically, be able to fabricat a microstrip ring resonator with higher performance. | zh_TW |
dc.language.iso | en_US | en_US |
dc.subject | 高溫超導;濺鍍;微波量測. | zh_TW |
dc.subject | High Tc Superconductor;Sputtering;Microwave Measurement. | en_US |
dc.title | 高溫超導材料研製及其微波性質探討 | zh_TW |
dc.title | High Tc Superconducting Thin Film Fabrication and Microwave Properties Studies. | en_US |
dc.type | Thesis | en_US |
dc.contributor.department | 電子研究所 | zh_TW |
Appears in Collections: | Thesis |