利用矽烷,氧氣及四氟化碳在電子迴旋共振系統中沉積之低介電常數氟氧化矽的研究

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	王士瑋	en_US
dc.contributor.author	WANG, SHIH-WEI	en_US
dc.contributor.author	張國明	en_US
dc.contributor.author	KOW-MING CHANG	en_US
dc.date.accessioned	2014-12-12T02:17:27Z	-
dc.date.available	2014-12-12T02:17:27Z	-
dc.date.issued	1996	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT850428040	en_US
dc.identifier.uri	http://hdl.handle.net/11536/61907	-
dc.description.abstract	none	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	電子迴旋共振	zh_TW
dc.subject	低介電常數	zh_TW
dc.subject	氟氧化矽	zh_TW
dc.subject	Electron Cyclotron Resonance	en_US
dc.subject	Low Dielectric Constant	en_US
dc.subject	Fluorinated Silicon Oxide	en_US
dc.title	利用矽烷,氧氣及四氟化碳在電子迴旋共振系統中沉積之低介電常數氟氧化矽的研究	zh_TW
dc.title	The Study of Low Dielectric Constant Fluorinated Silicon Oxide, Fabricated by Electron Cyclotron Resonance System with SiH4, O2 and CF4 as Reaction Gases	en_US
dc.type	Thesis	en_US
dc.contributor.department	電子研究所	zh_TW
顯示於類別：	畢業論文