標題: | Characterizations of AgInSbTe and Its Nanocomposite Thin Films for Phase-Change Memory Applications |
作者: | Huang, Yu-Jen Chung, Tzu-Chin Wang, Chiung-Hsin Hsieh, Tsung-Eong 材料科學與工程學系 Department of Materials Science and Engineering |
公開日期: | 2010 |
摘要: | Phase transition kinetics and microstructures of AgInSbTe (AIST) and AIST-SiO(2) nanocomposite applied to phase-change memories (PCMs) are investigated. In situ electrical property measurement found that the incorporation of SiO(2) escalates the recrystallization temperature (T(x)) of nanocomposite. Both X-ray diffraction and transmission electron microscopy showed grain refinement in the nanocomposite which, in turn, results in an increase of the activation energy (E(a)) of phase transition, as indicated by subsequent Kissinger's analysis. Increase of T(x) and E(a) in the nanocomposite was ascribed to AIST grain refinement and hindrance to grain growth due to dispersed SiO(2) particles in the sample matrix. Johnson-Mehl-Avrami analysis revealed the decrease of Avrami exponent in nanocomposite, implying that the dispersed SiO(2) particles promote the heterogeneous phase transition. Static I-V characteristics and reversible binary switching behavior of PCM devices not only confirmed the results of microstructure characterizations but also illustrated the feasibility of the AIST and its nanocomposite layer for PCM fabrication. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3502531] All rights reserved. |
URI: | http://hdl.handle.net/11536/6194 http://dx.doi.org/10.1149/1.3502531 |
ISSN: | 0013-4651 |
DOI: | 10.1149/1.3502531 |
期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volume: | 157 |
Issue: | 12 |
起始頁: | P113 |
結束頁: | P118 |
顯示於類別: | 期刊論文 |