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dc.contributor.authorYao, L.en_US
dc.contributor.authorMebel, A. M.en_US
dc.contributor.authorLin, S. H.en_US
dc.date.accessioned2014-12-08T15:08:03Z-
dc.date.available2014-12-08T15:08:03Z-
dc.date.issued2009-12-31en_US
dc.identifier.issn1089-5639en_US
dc.identifier.urihttp://dx.doi.org/10.1021/jp9044379en_US
dc.identifier.urihttp://hdl.handle.net/11536/6303-
dc.description.abstractThe dissociation rate constants for hydrogen fluoride dimers; are calculated using the YL method, proposed by Yao and Lin (Yao, L.; Mebel, A. M.; Lu, H. F.; Neusser, H. J.; Lin, S. H. J.. Phys. Chem. A 2007, 111, 6722). The dividing surface method and RRKM theory are also used to obtain pseudo-transition states and rate constants, respectively. For the dissociation of HF dimers, the anharmonic rate constants are around 3.02 x 10(10) to 3.46 x 10(12) s(-1), while the harmonic rate constants are in the range of 2.93 x 10(10) to 1.66 x 10(13) s(-1), at a temperature range of 243-1000 K, for the canonical case. For the microcanonical case, the anharmonic rate constants are in the range of 1.91 x 10(12) to 1.32 x 10(13) s(-1) and the harmonic rate constants are in the range of 1.89 x 10(12) to 4.93 x 10(13) s(-1), with a total energy range of 1338-4500 cm(-1). Both harmonic and anharmonic rate constants are only comparable to the experimental results 0.5 x 10(10) s(-1) and 1 x 10(11) s(-1) in an inert gas bath at room temperature. In this case the harmonic and anharmonic rate constants show similar results in this calculation. The results of this paper indicate that the YL method is suitable for calculating dissociation rate constants of small flexible HF dimers and the anharmonic effect should be included.en_US
dc.language.isoen_USen_US
dc.titleDissociation Rate Constant of the Hydrogen Fluoride Dimer by the ab Initio Anharmonic RRKM Theoryen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/jp9044379en_US
dc.identifier.journalJOURNAL OF PHYSICAL CHEMISTRY Aen_US
dc.citation.volume113en_US
dc.citation.issue52en_US
dc.citation.spage14664en_US
dc.citation.epage14669en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000273263700060-
dc.citation.woscount14-
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