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dc.contributor.authorLien, Chien-Yuen_US
dc.contributor.authorLin, Wei-Yenen_US
dc.contributor.authorChen, Hsueh-Yingen_US
dc.contributor.authorHuang, Wen-Tsungen_US
dc.contributor.authorJin, Bingen_US
dc.contributor.authorChen, I-Chengen_US
dc.contributor.authorLin, Jim J.en_US
dc.date.accessioned2014-12-08T15:08:16Z-
dc.date.available2014-12-08T15:08:16Z-
dc.date.issued2009-11-07en_US
dc.identifier.issn0021-9606en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3257682en_US
dc.identifier.urihttp://hdl.handle.net/11536/6439-
dc.description.abstractThis study utilized a mass-resolved detection of ClOOCl to determine its photodissociation cross section, which is the product of the absorption cross section and dissociation quantum yield. An effusive molecular beam of ClOOCl was generated and its photodissociation probability was determined through measuring the decrease in the ClOOCl beam intensity upon laser irradiation. By comparing with a reference molecule, the absolute cross sections of ClOOCl were obtained without knowing its absolute concentration. The determined cross section of ClOOCl at 248.4 nm is (8.85 +/- 0.42)x10(-18) cm(2) at 200 K, significantly larger than previously reported values. The temperature dependence of the cross section was investigated at 248.4 nm in the range of 160-260 K; only a very small and negative temperature effect was observed. Because 248.4 nm is very close to the peak of the UV absorption band of ClOOCl, this work provides a new calibration point for normalizing relative absorption spectra of ClOOCl. In this work, the photodissociation cross section at 266 nm and 200 K was also reported to be (4.13 +/- 0.21)x10(-18) cm(2).en_US
dc.language.isoen_USen_US
dc.subjectchlorine compoundsen_US
dc.subjectphotodissociationen_US
dc.subjectspectrochemical analysisen_US
dc.titlePhotodissociation cross sections of ClOOCl at 248.4 and 266 nmen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3257682en_US
dc.identifier.journalJOURNAL OF CHEMICAL PHYSICSen_US
dc.citation.volume131en_US
dc.citation.issue17en_US
dc.citation.epageen_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000271664500021-
dc.citation.woscount16-
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