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dc.contributor.authorYu, Bang-Yingen_US
dc.contributor.authorLin, Wei-Chunen_US
dc.contributor.authorHuang, Jen-Hsienen_US
dc.contributor.authorChu, Chih-Weien_US
dc.contributor.authorLin, Yu-Chinen_US
dc.contributor.authorKuo, Che-Hungen_US
dc.contributor.authorLee, Szu-Hsianen_US
dc.contributor.authorWong, Ken-Tsengen_US
dc.contributor.authorHo, Kuo-Chuanen_US
dc.contributor.authorShyue, Jing-Jongen_US
dc.date.accessioned2014-12-08T15:08:18Z-
dc.date.available2014-12-08T15:08:18Z-
dc.date.issued2009-11-01en_US
dc.identifier.issn0003-2700en_US
dc.identifier.urihttp://dx.doi.org/10.1021/ac901588ten_US
dc.identifier.urihttp://hdl.handle.net/11536/6453-
dc.description.abstractSolution-processable fullerene and copolymer bulk-heterojunctions are widely used as the active layer of solar cells. It is known that the controlled phase-separation in the film provides a pathway for carrier transportation and is crucial to efficiency. In this work, scanning electrical potential microscopy (SEPM) is used to examine the surface distribution of [6,6]phenyl-C61-butyric acid methyl ester and poly(3-hexylthiophene), which form the bulk-heterojunction. Because the two components have different energies in the highest occupied molecular orbital (HOMO), the differences in contact potential yield strong contrast in SEPM. A cluster ion beam (C(60)(+)) is used to remove the surface in order to determine the structure below, and SEPM is used to analyze the newly exposed surface. With the SEPM images acquired from different depth through the material stacked, a 3D volume image is obtained. It is demonstrated that using SEPM with cluster ion slicing is an effective tool for studying the 3D nanostructures of soft materials.en_US
dc.language.isoen_USen_US
dc.titleThree-Dimensional Nanoscale Imaging of Polymer Bulk-Heterojunction by Scanning Electrical Potential Microscopy and C(60)(+) Cluster Ion Slicingen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/ac901588ten_US
dc.identifier.journalANALYTICAL CHEMISTRYen_US
dc.citation.volume81en_US
dc.citation.issue21en_US
dc.citation.spage8936en_US
dc.citation.epage8941en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
Appears in Collections:Articles