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dc.contributor.authorWu, Yu-Shengen_US
dc.contributor.authorSu, Pinen_US
dc.date.accessioned2014-12-08T15:08:20Z-
dc.date.available2014-12-08T15:08:20Z-
dc.date.issued2009-11-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2009.2030714en_US
dc.identifier.urihttp://hdl.handle.net/11536/6471-
dc.description.abstractThis paper presents an analytical model for quantum-confinement effects in short-channel gate-all-around (GAA) MOSFETs under the subthreshold region. Our analytical model accurately predicts the impact of short-channel effects and doping concentration on the quantum-confinement effects. This scalable quantum-confinement model is crucial to the ultrascaled GAA MOSFET design.en_US
dc.language.isoen_USen_US
dc.subjectGate-all-around (GAA)en_US
dc.subjectMOSFETen_US
dc.subjectquantum effectsen_US
dc.subjectshort-channel effecten_US
dc.titleAnalytical Quantum-Confinement Model for Short-Channel Gate-All-Around MOSFETs Under Subthreshold Regionen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2009.2030714en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume56en_US
dc.citation.issue11en_US
dc.citation.spage2720en_US
dc.citation.epage2725en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000271019500044-
dc.citation.woscount14-
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