標題: | Characterization of patterned poly(methyl methacrylate) brushes under various structures upon solvent immersion |
作者: | Chen, Jem-Kun Hsieh, Chih-Yi Huang, Chih-Feng Li, Po-min 應用化學系 Department of Applied Chemistry |
關鍵字: | ATRP;Grafting density;Surface coverage;Very-large-scale integration;PMMA brush |
公開日期: | 15-十月-2009 |
摘要: | In this paper we describe a graft polymerization/solvent immersion method for generating various patterns of polymer brushes. We used a very-large-scale integration (VLSI) process and oxygen plasma system to generate well-defined patterns of polymerized methyl methacrylate (MMA) on patterned Si(1 0 0) surfaces through atom transfer radical polymerization (ATRP). After immersion of wafers presenting lines of these PMMA brushes in water and tetrahydrofuran, we observed mushroom-and brush-like regimes through grafting densities and surface coverages, respectively, for the PMMA brushes with various pattern resolutions. In the mushroom-like regime, the distance between lines of PMMA brushes was smaller than that of the lines patterned lithographically on the wafer; in the brush-like regime, this distance was approximately the same. This new strategy allows polymer brushes to be prepared through graft polymerization and then have their patterns varied through solvent immersion. (C) 2009 Elsevier Inc. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.jcis.2009.06.040 http://hdl.handle.net/11536/6562 |
ISSN: | 0021-9797 |
DOI: | 10.1016/j.jcis.2009.06.040 |
期刊: | JOURNAL OF COLLOID AND INTERFACE SCIENCE |
Volume: | 338 |
Issue: | 2 |
起始頁: | 428 |
結束頁: | 434 |
顯示於類別: | 期刊論文 |