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dc.contributor.authorJangjian, Peng-Chungen_US
dc.contributor.authorLiu, Tzeng-Fengen_US
dc.contributor.authorTsai, Chuan-Meien_US
dc.contributor.authorLi, Mei-Yien_US
dc.contributor.authorTsai, Ming-Shihen_US
dc.contributor.authorTseng, Shin-Huaen_US
dc.contributor.authorCheng, Tsai-Muen_US
dc.contributor.authorChang, Chia-Chingen_US
dc.date.accessioned2014-12-08T15:08:35Z-
dc.date.available2014-12-08T15:08:35Z-
dc.date.issued2009-10-01en_US
dc.identifier.issn0577-9073en_US
dc.identifier.urihttp://hdl.handle.net/11536/6600-
dc.description.abstractConventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using traditional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer similar to 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.en_US
dc.language.isoen_USen_US
dc.titleDNA Mismatch Detection by Metal Ion Enhanced Impedance Analysisen_US
dc.typeArticleen_US
dc.identifier.journalCHINESE JOURNAL OF PHYSICSen_US
dc.citation.volume47en_US
dc.citation.issue5en_US
dc.citation.spage740en_US
dc.citation.epage747en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department生物科技學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Biological Science and Technologyen_US
dc.identifier.wosnumberWOS:000271754000017-
dc.citation.woscount3-
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