標題: DNA Mismatch Detection by Metal Ion Enhanced Impedance Analysis
作者: Jangjian, Peng-Chung
Liu, Tzeng-Feng
Tsai, Chuan-Mei
Li, Mei-Yi
Tsai, Ming-Shih
Tseng, Shin-Hua
Cheng, Tsai-Mu
Chang, Chia-Ching
材料科學與工程學系
生物科技學系
Department of Materials Science and Engineering
Department of Biological Science and Technology
公開日期: 1-十月-2009
摘要: Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using traditional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer similar to 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.
URI: http://hdl.handle.net/11536/6600
ISSN: 0577-9073
期刊: CHINESE JOURNAL OF PHYSICS
Volume: 47
Issue: 5
起始頁: 740
結束頁: 747
顯示於類別:期刊論文


文件中的檔案:

  1. 000271754000017.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。