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dc.contributor.authorLin, Chen-Chunen_US
dc.contributor.authorPan, Fu-Mingen_US
dc.contributor.authorChang, Kai-Chunen_US
dc.contributor.authorKuo, Chuan-Wenen_US
dc.contributor.authorKuo, Cheng-Tzuen_US
dc.date.accessioned2014-12-08T15:08:37Z-
dc.date.available2014-12-08T15:08:37Z-
dc.date.issued2009-10-01en_US
dc.identifier.issn0925-9635en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.diamond.2009.06.002en_US
dc.identifier.urihttp://hdl.handle.net/11536/6618-
dc.description.abstractCarbon nanofibers (CNFs) were grown in the porous anodic aluminum oxide (AAO) thin film grown on the Si wafer by electron cyclotron resonance chemical vapor deposition using cobalt as the catalyst. A larger Co particle electrodeposited in the AAO pore channel produced vertically aligned CNFs with a tube diameter in compliance with the pore size of the AAO template. On the other hand, a smaller Co particle resulted in CNF growth with a nonuniform distribution of the tube diameter and a sparse tube density. Amorphous carbon residue produced under the plasma-assisted CNF growth condition seemed to play an essential role leading to the observation. A growth mechanism is proposed to delineate the volume effect of the electrodeposited Co catalyst on the CNF growth confined in pore channels of the AAO template. (C) 2009 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectCarbon nanofibersen_US
dc.subjectAnodic aluminum oxideen_US
dc.titleMechanistic study of cobalt catalyzed growth of carbon nanofibers in a confined space by plasma-assisted chemical vapor depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.diamond.2009.06.002en_US
dc.identifier.journalDIAMOND AND RELATED MATERIALSen_US
dc.citation.volume18en_US
dc.citation.issue10en_US
dc.citation.spage1301en_US
dc.citation.epage1305en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000270121100017-
dc.citation.woscount3-
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