完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Wang, Y. -C. | en_US |
dc.contributor.author | Ahn, H. | en_US |
dc.contributor.author | Chuang, C. -H. | en_US |
dc.contributor.author | Ku, Y. -P. | en_US |
dc.contributor.author | Pan, C. -L. | en_US |
dc.date.accessioned | 2014-12-08T15:08:45Z | - |
dc.date.available | 2014-12-08T15:08:45Z | - |
dc.date.issued | 2009-09-01 | en_US |
dc.identifier.issn | 0946-2171 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1007/s00340-009-3580-2 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/6693 | - |
dc.description.abstract | We investigated carrier-relaxation dynamics of femtosecond laser annealed (FLA) polycrystalline silicon (poly-Si). The correlation between morphology and electrical properties of poly-Si after femtosecond laser annealing is elucidated by optical-pump-terahertz-probe and terahertz time-domain spectroscopies. The transient conductivities of FLA-processed poly-Si with large (similar to 500 nm) and small (similar to 50 nm) grain sizes were both well fitted by the Drude model in the terahertz regime from 0.4 to 2 THz. The transient mobilities of these materials were determined to be 175 +/- 19.4 and 94.5 +/- 20.2 cm(2)/V s, respectively. After annealing, reduction of deep-state density rather than tail-state density in large-grain poly-Si is responsible for its higher mobility. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Grain-size-related transient terahertz mobility of femtosecond-laser-annealed polycrystalline silicon | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1007/s00340-009-3580-2 | en_US |
dc.identifier.journal | APPLIED PHYSICS B-LASERS AND OPTICS | en_US |
dc.citation.volume | 97 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 181 | en_US |
dc.citation.epage | 185 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000269844700023 | - |
dc.citation.woscount | 2 | - |
顯示於類別: | 期刊論文 |