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dc.contributor.author陳柏求en_US
dc.contributor.authorBo-chu chenen_US
dc.contributor.author陳明哲en_US
dc.contributor.authorMing-Jer chenen_US
dc.date.accessioned2014-12-12T02:30:44Z-
dc.date.available2014-12-12T02:30:44Z-
dc.date.issued2002en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT910428086en_US
dc.identifier.urihttp://hdl.handle.net/11536/70416-
dc.description.abstract順偏強化通道熱電子入射在快閃式記憶體中的應用中被用來作為寫入 的動作。順偏強化通道熱電子入射可以提供更好的導通電壓線性分布,使 得閘極電壓的可控制範圍比傳統的通道熱電子入射還要大。因此,順偏強 化通道熱電子入射可以提供良好的應用在多位元快閃記憶體上。而0.5伏 的順偏電壓選取是因為符合下面三項優點:(1)較高的寫入能力;(2)可以 接受的電流大小;以及(3)影響較小的干擾。zh_TW
dc.description.abstractA 0.5V forward bias enhanced channel hot eletron injection (FBECHEI) is developed for programming action. FBECHEI can provide a better linear behavior of threshold voltage in terms of a wider control gate voltage range compared with traditional CHEI;therefore, FBECHEI ensures promising potentials in multilevel applications. Other merits benefited from implementation of 0.5V forward bias enhancements are:(1) higher programming ability ;(2) tolerable current level; and (3) acceptable programming disturbs.en_US
dc.language.isozh_TWen_US
dc.subject快閃記憶體zh_TW
dc.subject順偏強化寫入zh_TW
dc.subjectflashen_US
dc.subjectmemoryen_US
dc.title順偏強化寫入機制於快閃式記憶體之探討zh_TW
dc.titleForward Bias Enhanced Channel Hot Electron Injection Scheme in Flash Memory cellsen_US
dc.typeThesisen_US
dc.contributor.department電子研究所zh_TW
Appears in Collections:Thesis