完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lin, Yow-Jon | en_US |
dc.contributor.author | Tsai, Chia-Lung | en_US |
dc.contributor.author | Liu, W. -R. | en_US |
dc.contributor.author | Hsieh, W. F. | en_US |
dc.contributor.author | Hsu, C. -H. | en_US |
dc.contributor.author | Tsao, Hou-Yen | en_US |
dc.contributor.author | Chu, Jian-An | en_US |
dc.contributor.author | Chang, Hsing-Cheng | en_US |
dc.date.accessioned | 2014-12-08T15:09:17Z | - |
dc.date.available | 2014-12-08T15:09:17Z | - |
dc.date.issued | 2009-07-01 | en_US |
dc.identifier.issn | 0021-8979 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.3157201 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/7089 | - |
dc.description.abstract | We report on the effect of ultraviolet (UV) treatment on the specific contact resistance (rho) and electronic transport at the Ti/ZnO interfaces. The experimental results show the same barrier height of Ti/ZnO samples without UV treatment as Ti/ZnO samples with UV treatment and the higher rho of Ti/ZnO samples with UV treatment than Ti/ZnO samples without UV treatment, suggesting the barrier-height independence of rho. Based on the thermionic-emission model and x-ray photoelectron spectroscopy results, we found that the induced decrease in the number of the hydroxides at the surface region of ZnO by UV treatment resulted in decreases in the electron concentration near the surface region and the excess current component related to tunneling, increasing in rho of Ti/ZnO samples. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | contact resistance | en_US |
dc.subject | electrical resistivity | en_US |
dc.subject | electron density | en_US |
dc.subject | II-VI semiconductors | en_US |
dc.subject | semiconductor-metal boundaries | en_US |
dc.subject | thermionic emission | en_US |
dc.subject | titanium | en_US |
dc.subject | wide band gap semiconductors | en_US |
dc.subject | X-ray photoelectron spectra | en_US |
dc.subject | zinc compounds | en_US |
dc.title | Effects of ultraviolet treatment on the contact resistivity and electronic transport at the Ti/ZnO interfaces | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.3157201 | en_US |
dc.identifier.journal | JOURNAL OF APPLIED PHYSICS | en_US |
dc.citation.volume | 106 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000268065000056 | - |
dc.citation.woscount | 4 | - |
顯示於類別: | 期刊論文 |