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dc.contributor.authorPintilie, L.en_US
dc.contributor.authorDragoi, C.en_US
dc.contributor.authorChu, Y. H.en_US
dc.contributor.authorMartin, L. W.en_US
dc.contributor.authorRamesh, R.en_US
dc.contributor.authorAlexe, M.en_US
dc.date.accessioned2014-12-08T15:09:20Z-
dc.date.available2014-12-08T15:09:20Z-
dc.date.issued2009-06-08en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3152784en_US
dc.identifier.urihttp://hdl.handle.net/11536/7122-
dc.description.abstractThe leakage current in epitaxial BiFeO(3) capacitors with bottom SrRuO(3) and top Pt electrodes, grown by pulsed laser deposition on SrTiO(3) (100), SrTiO(3) (110), and SrTiO(3) (111) substrates, is investigated by current-voltage (I-V) measurements in the 100-300 K temperature range. It is found that the leakage current is interface-limited and strongly dependent on the orientation of the substrate. The potential barriers at the electrode interfaces are estimated to about 0.6, 0.77, and 0.93 eV for the (100), (110), and (111) orientations, respectively.en_US
dc.language.isoen_USen_US
dc.titleOrientation-dependent potential barriers in case of epitaxial Pt-BiFeO(3)-SrRuO(3) capacitorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3152784en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume94en_US
dc.citation.issue23en_US
dc.citation.spageen_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
Appears in Collections:Articles