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dc.contributor.authorHsieh, Hong-Wenen_US
dc.contributor.authorYen, Shun-Tungen_US
dc.date.accessioned2014-12-08T15:09:28Z-
dc.date.available2014-12-08T15:09:28Z-
dc.date.issued2009-05-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3129616en_US
dc.identifier.urihttp://hdl.handle.net/11536/7232-
dc.description.abstractWe present a self-consistent model for the analysis of the carrier distribution, the band profile, and the transition energy of type-II aligned GaAs/GaSb/GaAs structures under optical excitation. The model considers the surface states as an electron reservoir, associated with pinning of the conduction band Fermi level at the midgap. In our model, the optical generated holes in the GaSb quantum well causes a potential well on one side of the GaSb layer, which can efficiently accommodate the optically generated electrons. Accordingly, we derive a relation connecting the excitation power to the carrier density. Using the relation and the effective triangular potential approximation, we obtain a simple formula for the transition energy shift as a function of the excitation power, which follows the cube-root rule quite well. The calculation allows the determination of the band offset of a type-II heterointerface by comparison with data from photoluminescence measurement. The result suggests the unstrained valence band offset of GaSb/GaAs to lie between 0.5 and 0.55 eV. We also present a simplified model for analyzing the electronic and optical properties of type-II heterostructures without the need of a self-consistent calculation.en_US
dc.language.isoen_USen_US
dc.subjectcarrier densityen_US
dc.subjectconduction bandsen_US
dc.subjectFermi levelen_US
dc.subjectgallium arsenideen_US
dc.subjectgallium compoundsen_US
dc.subjectIII-V semiconductorsen_US
dc.subjectsemiconductor quantum wellsen_US
dc.subjectsurface statesen_US
dc.subjectvalence bandsen_US
dc.titleAnalysis of GaAs/GaSb/GaAs structures under optical excitation considering surface states as an electron reservoiren_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3129616en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume105en_US
dc.citation.issue10en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000266500100084-
dc.citation.woscount4-
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