自動上光阻機異味逸散研究

Abstract

本文為探討發光二極體製造業(Light Emitting Diode，LED)自動上光阻機(Auto spin coater)，於塗佈製程時模擬箱體內的情境。光阻程序中使用的化學品區分為正光阻劑或負光阻劑，其主要成分為丙二醇單甲基醚酯(PGMEA)、丙二醇單甲基醚(PGME)，上述的化合物皆屬於揮發性有機氣體並具有極低的嗅覺閾值，如未加以控制，造成作業人員之吸入即產生不適，長期接觸亦可能導致其他職業疾病之發生，增加人員作業的風險。 本次以流場分析軟體，探討箱體內模擬風機-濾網機組(Fan Filter Units, FFU)送風後的情況，FFU 條件分別設定為原始設計的0.6 m/s及0.1 m/s以及未送風(0 m/s)的情形下，分別觀察10分鐘、15 分鐘及20 分鐘，共9 種情境模擬36 種動態截面圖研究逸散源擴散之情形。 綜合圖形模擬結果，FFU 在0.6m/s及0.1m/s時，並未能壓制逸散源，原因為FFU的送風會使空間內形成正壓環境，導致逸散源自箱體內向外的方式從門縫竄出，相反在FFU 未送風(0 m/s)的狀況下，僅以局部排氣設備進行排氣，會使其呈現負壓狀態，逸 散源反而能受到控制，使黃光區的異味狀況獲得良好的改善。

The light-emitting diode manufacturing (Light Emitting Diode, LED) Auto spin coater, and analysis and simulate the cabinets situational in developing process is studied numerically. The chemicals used in the photoresist program area is divided into, whose main component is propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), and the above compounds are the volatile organic gas and has a very low odor threshold value. If we not controlled well, the employees inbreathe the organic gas will produce discomfort. Additionally, long exposure in this environment may also lead to the occurrence of other occupational diseases and increase the health hazard of operators. In this paper, we use the CFD as the simulation software for this machine, to discover the analog fan filter unit (FFU) working in various gas field environment. FFU conditions were set at 0.6 m of the original design and to 0.1 m / s of not blowing (0 m / s), respectively. We research the fugitive source diffusion by observed for 10 minutes, 15 minutes and 20 minutes, the total of 9 kinds scenario to simulation the 36 kinds dynamic cross-sectional view. Summary graphics simulation results, the condition of the FFU without the air supply(0 m / s), exhaust the cabinets by local exhaust equipment will make the box present a negative pressure state, which can reach the, peculiar smell diffuse get good improvemen