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dc.contributor.authorHuang, Sheng-Yien_US
dc.contributor.authorChen, Kun-Mingen_US
dc.contributor.authorHuang, Guo-Weien_US
dc.contributor.authorChang, Chun-Yenen_US
dc.contributor.authorHung, Cheng-Chouen_US
dc.contributor.authorLiang, Victoren_US
dc.contributor.authorChen, Bo-Yuanen_US
dc.date.accessioned2014-12-08T15:09:46Z-
dc.date.available2014-12-08T15:09:46Z-
dc.date.issued2007en_US
dc.identifier.isbn978-1-4244-0687-6en_US
dc.identifier.issn0149-645Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/7479-
dc.description.abstractAn RF power MOSFET was proposed and manufactured in a standard 0.13 mu m CMOS technology. Without adding additional masks, cost and process, the breakdown voltage can be improved by using the N-well and shallow-trench-isolation processes to form a drift n(-) region. The breakdown voltage was 4.3V at gate bias of 1.2V. The cutoff frequency and maximum oscillation frequency were 68GHz and 87GHz, respectively. In addition, the power gain, output power and power-added efficiency were 16.8dB, 15.9dBm and 43.5%, respectively, at 2.4GHz. Good RF linearity also addressed OIP3 of 28.6dBm. The presented RF power transistor is cost effectively and can be applied into the power amplifier integration for RF SoC.en_US
dc.language.isoen_USen_US
dc.subjectCMOSen_US
dc.subjectlinearityen_US
dc.subjectpower transistoren_US
dc.subjectpower amplifieren_US
dc.subjectRF SoCen_US
dc.titleDesign for integration of RF power transistors in 0.13 mu m advanced CMOS technologyen_US
dc.typeArticleen_US
dc.identifier.journal2007 IEEE/MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-6en_US
dc.citation.spage323en_US
dc.citation.epage326en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000250827400075-
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