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dc.contributor.authorLu, Chu-Huaen_US
dc.contributor.authorKuo, Shiao-Weien_US
dc.contributor.authorHuang, Chih-Fengen_US
dc.contributor.authorChang, Feng-Chihen_US
dc.date.accessioned2014-12-08T15:09:47Z-
dc.date.available2014-12-08T15:09:47Z-
dc.date.issued2009-03-05en_US
dc.identifier.issn1932-7447en_US
dc.identifier.urihttp://dx.doi.org/10.1021/jp808635jen_US
dc.identifier.urihttp://hdl.handle.net/11536/7502-
dc.description.abstractWe have used a thiol-functionalized polyhedral oligomeric silsesquioxane (SH-POSS) as a protective group for the preparation of POSS-protected gold nanoparticles (POSS-Au NPs). The organic/inorganic hybrid SH-POSS NPs exhibited an interesting platelike morphology arising from steric hindrance between the isobutyl groups of SH-POSS. An XRD study of the SH-POSS crystal revealed the relatively large interstice (1.64 nm lattice constant a > 1.3 nm diameter SH-POSS) on the basal plane of the unit cell, which resulted in a platelike morphology having lateral dimensions on the order of a few micrometers and thicknesses of a few hundred nanometers. In addition to behaving as a stabilizer for the preparation of Au NPs, an excess of SH-POSS colloids led to the formation of a crystalline template that incorporated the POSS-Au hybrid NPs on its surface, providing a unique fernlike microstructure. After removal of the POSS template (through sublimation and decomposition to a silica char) at 350 degrees C in air for I h, nanosized Au islands having diameters of 50-100 nm and thicknesses of 2-20 nm were sintered onto the substrate. As a result, SH-POSS is an excellent protective group for the preparation of Au NPs of high stability in the powder state. In addition, we suspect that SH-POSS crystals could be used to disperse Au NPs onto substrates for a wide range of applications (e.g., Au catalysts).en_US
dc.language.isoen_USen_US
dc.titleSelf-Assembled Fernlike Microstructures of Polyhedral Oligomeric Silsesquioxane/Gold Nanoparticle Hybridsen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/jp808635jen_US
dc.identifier.journalJOURNAL OF PHYSICAL CHEMISTRY Cen_US
dc.citation.volume113en_US
dc.citation.issue9en_US
dc.citation.spage3517en_US
dc.citation.epage3524en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000263733200025-
dc.citation.woscount21-
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