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dc.contributor.authorChang, Chia-Taen_US
dc.contributor.authorHsiao, Shih-Kuangen_US
dc.contributor.authorChang, Edward Yien_US
dc.contributor.authorLu, Chung-Yuen_US
dc.contributor.authorHuang, Jui-Chienen_US
dc.contributor.authorLee, Ching-Tingen_US
dc.date.accessioned2014-12-08T15:09:52Z-
dc.date.available2014-12-08T15:09:52Z-
dc.date.issued2009-03-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2009.2012447en_US
dc.identifier.urihttp://hdl.handle.net/11536/7552-
dc.description.abstractThis letter investigates the characteristics of unpassivated AlGaN/GaN high-electron mobility transistors (HEMTs) under uniaxial tensile strain. Mechanical stress can produce additional charges that change the HEMT channel current. is phenomenon is dependent upon gate orientation and may be the result of the piezoelectric effect and changes in electron mobility due to the applied uniaxial stress. In addition, results show that tensile strain reduces the transient current, which is, likely due to the additional donorlike surface states created through the piezoelectric effect.en_US
dc.language.isoen_USen_US
dc.subjectAlGaN/GaNen_US
dc.subjectgate orientationsen_US
dc.subjecthigh-electron mobility transistors (HEMTs)en_US
dc.subjecttransient currenten_US
dc.subjectuniaxial tensile strainen_US
dc.titleChanges of Electrical Characteristics for AlGaN/GaN HEMTs Under Uniaxial Tensile Strainen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2009.2012447en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume30en_US
dc.citation.issue3en_US
dc.citation.spage213en_US
dc.citation.epage215en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000263920400004-
dc.citation.woscount13-
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