完整後設資料紀錄
DC 欄位語言
dc.contributor.author李昭安en_US
dc.contributor.authorChao-An Leeen_US
dc.contributor.author李安謙en_US
dc.contributor.authorAn-Chen Leeen_US
dc.date.accessioned2014-12-12T02:51:18Z-
dc.date.available2014-12-12T02:51:18Z-
dc.date.issued2007en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT009275503en_US
dc.identifier.urihttp://hdl.handle.net/11536/77953-
dc.description.abstract本論文結合卡曼濾波器及最小變異控制器來改善化學氣相沈積之硬遮罩硼矽玻璃製程品質。首先由實驗設計得到影響製程品質特性之主要控制因子,再藉由非線性多元迴歸法得到控制模型,經由卡曼濾波器(Kalman Filter)更新每批次之控制模型參數,再透過最小變異控制器 (Minimum Variance Controller)來更新製程配方。於本論文中運用了真實化學氣相沈積資料來進行模擬及展現本先進製程控制器之性能,其結果顯示利用本控制法可大幅改善硬遮罩硼矽玻璃製中因為製程干擾所產生的製程變異,最後本論文將實際驗證於8吋半導體廠中。zh_TW
dc.description.abstractThis thesis proposes an advanced process controller which combines kalman filter and Minimum Variance Controller (MVC) to improve the process variance of Pad-Boron Silicon Glass (Pad-BSG) of Plasma Enhanced-Chemical Vapor Deposition (PE-CVD) process. Firstly, we use Design of Experiment (DOE) method to obtain the control factors which can affect the process characteristic. The control model’s parameters which can be updated by kalman filter every batch is established by non-linear multi-regression. The recipe of PE-CVD process is generated by MVC finally. This thesis presents the performance of an advanced process controller in simulation with historical process data and experiment it on PE-CVD process in 8-inch fabrication. The experiment results show that the process variance converges fast and stably to the target value; moreover, the stability of process is also increased.en_US
dc.language.isozh_TWen_US
dc.subject卡曼濾波器zh_TW
dc.subject最小變異控制器zh_TW
dc.subject實驗設計zh_TW
dc.subject硬遮罩硼矽玻璃製程zh_TW
dc.subject化學氣相沈積zh_TW
dc.subjectkalman filteren_US
dc.subjectMinimum Variance Controller (MVC)en_US
dc.subjectDesign of Experiment (DOE)en_US
dc.subjectPad-Boron Silicon Glass (Pad-BSG)en_US
dc.subjectPlasma Enhanced-Chemical Vapor Deposition (PE-CVD)en_US
dc.title結合卡曼濾波器及最小變異控制器進行PECVD機台先進製程控制zh_TW
dc.titleAdvanced Process Control for PECVD Equipment Using Kalman Filter and Minimum Variance Controlleren_US
dc.typeThesisen_US
dc.contributor.department工學院半導體材料與製程設備學程zh_TW
顯示於類別:畢業論文