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dc.contributor.authorLee, C. E.en_US
dc.contributor.authorCheng, B. S.en_US
dc.contributor.authorLee, Y. C.en_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorWang, S. C.en_US
dc.date.accessioned2014-12-08T15:10:21Z-
dc.date.available2014-12-08T15:10:21Z-
dc.date.issued2009en_US
dc.identifier.issn1099-0062en_US
dc.identifier.urihttp://hdl.handle.net/11536/7910-
dc.identifier.urihttp://dx.doi.org/10.1149/1.3046003en_US
dc.description.abstractNitride-based UV, vertical-injection light-emitting diodes (VLEDs) with GaN-free and surface roughness structures operating at 365 nm were proposed and demonstrated by a combination of wafer bonding and laser lift-off processes. The GaN-free structure offers a promising potential for enhancing the light output of UV-VLEDs. The 3.2x light output enhancement was performed by removing the GaN. With the help of adopting a roughened surface, the light-output power of the UV-VLEDs could be further enhanced by a factor of 2.3 as compared with that of UV-VLED without a roughened surface. The total enhancement of surface-roughened GaN-free UV-VLEDs was increased by a factor of 7.8 compared to that of conventional UV-LEDs at a driving current injection of 250 mA.en_US
dc.language.isoen_USen_US
dc.subjectlaser materials processingen_US
dc.subjectlight emitting diodesen_US
dc.subjectsurface roughnessen_US
dc.subjectwafer bondingen_US
dc.titleOutput Power Enhancement of Vertical-Injection Ultraviolet Light-Emitting Diodes by GaN-Free and Surface Roughness Structuresen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.3046003en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.citation.volume12en_US
dc.citation.issue2en_US
dc.citation.spageH44en_US
dc.citation.epageH46en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000261698500018-
dc.citation.woscount2-
Appears in Collections:Articles