完整後設資料紀錄
DC 欄位語言
dc.contributor.authorHung, Tsung-Chien_US
dc.contributor.authorChen, Chia-Fuen_US
dc.contributor.authorChen, Chien-Chungen_US
dc.contributor.authorWhang, Wha-Tzongen_US
dc.date.accessioned2014-12-08T15:10:26Z-
dc.date.available2014-12-08T15:10:26Z-
dc.date.issued2009-01-01en_US
dc.identifier.issn0169-4332en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.apsusc.2008.10.008en_US
dc.identifier.urihttp://hdl.handle.net/11536/7974-
dc.description.abstractWe have used a microwave plasma-enhanced chemical vapor deposition system to synthesize two-dimensional (2D) and three-dimensional (3D) structures of carbon nanoflakes (CNFs). This catalyst-free, low-temperature synthesis involved introducing CO(2) and CH(4) as reactants at a specified ratio of 2:3. We obtained uniform 2D arrays of CNFs at lower microwave powers (200 or 300 W) and substrate temperatures (up to 420 degrees C); their thickness was close to 1 mm. At a microwave power of 400 W, we obtained a 3D architecture comprising the smallest nanoflakes reported to date. The specific surface area of the 3D structure was double that of the corresponding 2D arrays. We suspect that such structured carbon materials might have great potential for energy storage applications. (C) 2008 Elsevier B. V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectNanostructuresen_US
dc.subjectChemical vapor depositionen_US
dc.subjectElectrodesen_US
dc.titleCatalyst-free, low-temperature growth of high-surface area carbon nanoflakes on carbon clothen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.apsusc.2008.10.008en_US
dc.identifier.journalAPPLIED SURFACE SCIENCEen_US
dc.citation.volume255en_US
dc.citation.issue6en_US
dc.citation.spage3676en_US
dc.citation.epage3681en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000261972100036-
dc.citation.woscount2-
顯示於類別:期刊論文


文件中的檔案:

  1. 000261972100036.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。