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dc.contributor.authorMou, Chun-Haoen_US
dc.contributor.authorWitek, Henryk A.en_US
dc.date.accessioned2014-12-08T15:10:30Z-
dc.date.available2014-12-08T15:10:30Z-
dc.date.issued2008-12-28en_US
dc.identifier.issn0021-9606en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3043823en_US
dc.identifier.urihttp://hdl.handle.net/11536/8015-
dc.description.abstractEquilibrium structures, energetic stability, and vibrational frequencies of noble-gas containing metal halides, MNgX and NgMX (Ng=Ar,Kr,Xe; M=Cu,Ag,Au; X=F,Cl,Br) have been studied computationally using coupled cluster, density functional, and perturbation techniques. The NgMX species have been found to be stable with the Ng-M bond dissociation energy of 2-22 kcal/mol. Our calculations indicate that the argon-containing MNgX compounds are unstable or very weakly bound. For most of the krypton- and xenon-containing species, well-defined (MNg)(delta+)X(delta-) equilibrium structures have been located. Large MNgX -> Ng+MX reorganization barriers for some of the MNgX molecules (e.g., AuXeF and AuXeCl) indicate their considerable kinetic stability. The presented results suggest that direct observation of the most stable of the MNgX molecules might be possible in experiment.en_US
dc.language.isoen_USen_US
dc.subjectargon compoundsen_US
dc.subjectcopper compoundsen_US
dc.subjectcoupled cluster calculationsen_US
dc.subjectdensity functional theoryen_US
dc.subjectdissociation energiesen_US
dc.subjectgold compoundsen_US
dc.subjectkrypton compoundsen_US
dc.subjectmolecular configurationsen_US
dc.subjectperturbation theoryen_US
dc.subjectsilver compoundsen_US
dc.subjectvibrational statesen_US
dc.subjectxenon compoundsen_US
dc.titleTheoretical study of noble-gas containing metal halidesen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3043823en_US
dc.identifier.journalJOURNAL OF CHEMICAL PHYSICSen_US
dc.citation.volume129en_US
dc.citation.issue24en_US
dc.citation.epageen_US
dc.contributor.department應用化學系zh_TW
dc.contributor.department應用化學系分子科學碩博班zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.contributor.departmentInstitute of Molecular scienceen_US
dc.identifier.wosnumberWOS:000262226800024-
dc.citation.woscount8-
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