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| Crucial integration of high work-function metal gate and high-k blocking oxide on charge-trapping type flash memory device | 120 |
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| 六月 2025 | 七月 2025 | 八月 2025 | 九月 2025 | 十月 2025 | 十一月 2025 | 十二月 2025 | |
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| Crucial integration of high work-function metal gate and high-k blocking oxide on charge-trapping type flash memory device | 0 | 0 | 0 | 0 | 0 | 1 | 1 |
檔案下載
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