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dc.contributor.authorLin, Y. C.en_US
dc.contributor.authorChou, W. C.en_US
dc.contributor.authorFan, W. C.en_US
dc.contributor.authorKu, J. T.en_US
dc.contributor.authorKe, F. K.en_US
dc.contributor.authorWang, W. J.en_US
dc.contributor.authorYang, S. L.en_US
dc.contributor.authorChen, W. K.en_US
dc.contributor.authorChang, W. H.en_US
dc.contributor.authorChia, C. H.en_US
dc.date.accessioned2014-12-08T15:10:31Z-
dc.date.available2014-12-08T15:10:31Z-
dc.date.issued2008-12-15en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3054162en_US
dc.identifier.urihttp://hdl.handle.net/11536/8026-
dc.description.abstractKohlrausch's stretched exponential law correlates well with the photoluminescence (PL) decay profiles of ZnSe(1-x)Te(x). As the Te concentration increases, the stretching exponent beta initially declines and then monotonically increases. This result can be understood using the hopping-transport and energy transfer model. The increase in the number of isoelectronic Te localized traps can reduce the PL decay rate and increase the linewidth, whereas the hybridization of the Te localized states with the valence-band edge states causes a reduction in both the lifetime and linewidth.en_US
dc.language.isoen_USen_US
dc.titleTime-resolved photoluminescence of isoelectronic traps in ZnSe(1-x)Te(x) semiconductor alloysen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3054162en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume93en_US
dc.citation.issue24en_US
dc.citation.spageen_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
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