Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 余松蒔 | en_US |
| dc.contributor.author | Sung-Shih Yu | en_US |
| dc.contributor.author | 曾俊元 | en_US |
| dc.contributor.author | Tseung-Yuen Tseng | en_US |
| dc.date.accessioned | 2014-12-12T03:02:33Z | - |
| dc.date.available | 2014-12-12T03:02:33Z | - |
| dc.date.issued | 2006 | en_US |
| dc.identifier.uri | http://140.113.39.130/cdrfb3/record/nctu/#GT009411568 | en_US |
| dc.identifier.uri | http://hdl.handle.net/11536/80482 | - |
| dc.description.abstract | 本論文中,是探討以濺鍍法使用TiN鈀在混合N2/O2比例的條件下長氮摻雜二氧化鈦薄膜於塑膠和玻璃上。從UV-VIS吸收光譜儀可以觀察到在PET和玻璃上的摻雜氮的二氧化鈦薄膜有特殊的吸收度曲線往電子能階較低的可見光波段區移動。氮摻雜二氧化鈦薄膜厚度越厚吸收度越高,而且在可見光波段區有越明顯的峰值。此薄膜的電子能階會隨著氮摻雜的濃度升高而縮小。鍍有此薄膜的塑膠和玻璃基板用紫外光和可見光照射會表現為低接觸角的特性。在濺鍍功率為20瓦到120瓦,60分鐘的濺鍍時間和5%氮的情況下,此薄膜在塑膠上分別照射紫外光和可見光可以得到的接觸角為最好的情況分別為8度和35度。在濺鍍功率為60瓦到100瓦,60分鐘到90分鐘的濺鍍時間和12.3%氮的情況下,此薄膜在玻璃上分別照射紫外光和可見光可以得到的接觸角為最好的情況分別為4度和30度。接觸角的好壞除了他本身照射光後的親水特性好壞之外,也跟他的表面粗糙程度有關。 | zh_TW |
| dc.description.abstract | In this thesis, the nitrogen-doped thin films were prepared on PET and glass plates using sputtering method with TiN target under a N2/O2 gas mixture. UV-VIS absorbance spectroscopy of PET and glass coated with TiO2-xNx thin films appear a significant shift of the absorption edge to a lower energy in the visible-light region for both PET and glass substrates. Absorption spectra of TiO2-xNx thin films obtain higher intensity with increasing thickness, and appear absorption peaks in the visible region. The energy band gaps of TiO2-xNx thin films narrow with increasing nitrogen. PET and glass plates coated with TiO2-xNx thin films were found to exhibit a low water contact angle than without coated membranes when the surfaces were illuminated with UV and visible light in the air. In the conditions of 20~120W power supply, 60min sputtering time and 5% nitrogen flow ratios, the TiO2-xNx thin film on the PET substrate upon UV-VIS light illumination exhibits lowest water contact angle near 8o and 35o respectively. In the conditions of 60~100W power supply, 60~90min sputtering time and 12.3% nitrogen flow ratios, the TiO2-xNx thin film on the glass substrate upon UV-VIS light illumination exhibits lowest water contact angle near 4o and 30o respectively. Roughness and the photo-induced surface wettability conversion reaction of the thin films affect the degrees of water contact angles. | en_US |
| dc.language.iso | en_US | en_US |
| dc.subject | 親水性 | zh_TW |
| dc.subject | 吸收度 | zh_TW |
| dc.subject | 二氧化鈦 | zh_TW |
| dc.subject | 接觸角 | zh_TW |
| dc.subject | hydrophilicity | en_US |
| dc.subject | absorbance | en_US |
| dc.subject | TiO2 | en_US |
| dc.subject | contact angle | en_US |
| dc.title | 以濺鍍法製備氮摻雜二氧化鈦薄膜物性及光學特性之研究 | zh_TW |
| dc.title | Physical and Optical Characteristics of Sputtered Deposited TiO2-xNx Thin Films | en_US |
| dc.type | Thesis | en_US |
| dc.contributor.department | 電子研究所 | zh_TW |
| Appears in Collections: | Thesis | |
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