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dc.contributor.authorLee, H. C.en_US
dc.contributor.authorSun, K. W.en_US
dc.contributor.authorLee, C. P.en_US
dc.date.accessioned2014-12-08T15:10:35Z-
dc.date.available2014-12-08T15:10:35Z-
dc.date.issued2008-12-01en_US
dc.identifier.issn0268-1242en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0268-1242/23/12/125043en_US
dc.identifier.urihttp://hdl.handle.net/11536/8097-
dc.description.abstractQuasi-two-dimensional (Q2D) Coulomb interactions between plasmons and phonons in a GaAs quantum well are studied numerically. Based on the dielectric continuum model, the plasmon-confined phonon coupling and plasmon-symmetric (+/-) interface phonon coupling are considered. By using renormalized phonon propagators, six branches involving plasmon-like and phonon-like modes are obtained and used to study the effect on the hot-carrier average energy-loss rate (AELR). Plasmon-like modes are demonstrated to enhance the AELR around the sheet carrier density of 10(11) cm(-2) due to a significant contribution of the plasmon-symmetric (+) interface phonon coupled mode. The importance of interface phonon modes on the plasmon-phonon coupling (PPC) is also indicated. If the interface phonon is not considered, the AELR enhancement due to the PPC will not appear. In addition, the carrier temperature is found to be important for the AELR enhancement. As the carrier temperature is as low as possible, the AELR enhances more remarkably because the effect of reabsorption of plasmon-like modes for hot carriers (hot-plasmon effect) can be greatly suppressed.en_US
dc.language.isoen_USen_US
dc.titleEffect of double heterojunctions on the plasmon-phonon coupling in a GaAs/Al(0.24)Ga(0.76)As quantum wellen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0268-1242/23/12/125043en_US
dc.identifier.journalSEMICONDUCTOR SCIENCE AND TECHNOLOGYen_US
dc.citation.volume23en_US
dc.citation.issue12en_US
dc.citation.epageen_US
dc.contributor.department應用化學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000261114300045-
dc.citation.woscount1-
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