標題: 以全像微影法製作一維週期性結構
A study on fabrication of one-dimensional periodic gratings by using holographic lithography
作者: 曾士芫
許根玉
林烜輝
光電工程學系
關鍵字: 全像微影;干涉;SU8;負光阻;holographic lithography;grating;SU8;photoresist
公開日期: 2006
摘要: 本論文主要是研究利用兩道等強度雷射光束(351nm)相干產生干涉場,並對塗佈在玻璃基版上的SU8負光阻劑曝光,製作一維週期性光柵結構,並調整製作過程中的曝光劑量與曝後熱烤時間,探討對光柵結構深度與表面分佈情況的影響,嘗試找出最適當的製作條件。另外我們量測光柵繞射效率,探討以純量繞射理論描述此光柵繞射行為的可行性。
In this thesis, we use two-beam interference to fabricate one-dimensional periodic gratings on the SU-8 negative photoresist, which is deposited by spin coating onto glass substrates. By properly adjusting the exposure energies and the post-exposure-bake time, the structure of the gratings can be modified. In addition, we also measure the diffraction efficiency, and try to explain the grating diffraction by scalar diffraction theory.
URI: http://140.113.39.130/cdrfb3/record/nctu/#GT009424554
http://hdl.handle.net/11536/81374
Appears in Collections:Thesis


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