標題: Improved air stability of n-channel organic thin-film transistors with surface modification on gate dielectrics
作者: Chen, Fang-Chung
Liao, Cheng-Hsiang
光電工程學系
顯示科技研究所
Department of Photonics
Institute of Display
公開日期: 8-九月-2008
摘要: The air stability of n-channel organic thin film transistors based on N, N' -dioctyl-3,4,9,10-perylene tetracarboxylic diimide is improved when modifying the dielectric surfaces with polymer insulators. The hydrophobic nature of the polymer surface inhibits protonation of the siloxyl groups on the SiO(2) surface, leading to fewer SiO(-) groups that can behave as electron traps. Among the polymer insulators tested, the devices modified with hydroxyl-free polymers exhibited the best air stabilities. (c) 2008 American Institute of Physics.
URI: http://dx.doi.org/10.1063/1.2980421
http://hdl.handle.net/11536/8362
ISSN: 0003-6951
DOI: 10.1063/1.2980421
期刊: APPLIED PHYSICS LETTERS
Volume: 93
Issue: 10
結束頁: 
顯示於類別:期刊論文


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