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dc.contributor.authorChen, Fang-Chungen_US
dc.contributor.authorLiao, Cheng-Hsiangen_US
dc.date.accessioned2014-12-08T15:10:56Z-
dc.date.available2014-12-08T15:10:56Z-
dc.date.issued2008-09-08en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2980421en_US
dc.identifier.urihttp://hdl.handle.net/11536/8362-
dc.description.abstractThe air stability of n-channel organic thin film transistors based on N, N' -dioctyl-3,4,9,10-perylene tetracarboxylic diimide is improved when modifying the dielectric surfaces with polymer insulators. The hydrophobic nature of the polymer surface inhibits protonation of the siloxyl groups on the SiO(2) surface, leading to fewer SiO(-) groups that can behave as electron traps. Among the polymer insulators tested, the devices modified with hydroxyl-free polymers exhibited the best air stabilities. (c) 2008 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleImproved air stability of n-channel organic thin-film transistors with surface modification on gate dielectricsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2980421en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume93en_US
dc.citation.issue10en_US
dc.citation.epageen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000259797000099-
dc.citation.woscount38-
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