完整後設資料紀錄
DC 欄位語言
dc.contributor.authorHuang, Wen-Hsienen_US
dc.contributor.authorYang, Yu-Linen_US
dc.contributor.authorWu, Shich-Chuanen_US
dc.date.accessioned2014-12-08T15:11:01Z-
dc.date.available2014-12-08T15:11:01Z-
dc.date.issued2008-09-01en_US
dc.identifier.issn1071-1023en_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.2975202en_US
dc.identifier.urihttp://hdl.handle.net/11536/8436-
dc.description.abstractCu was grown successfully on Ni film as a conductive layer that demonstrated a stronger Cu (111) preferred crystallographic orientation. Furthermore, we studied the scale effect of various periods of patterned Ni lines separated by variable widths of SiO2. When Cu was electroplated onto this patterned Ni, it preferentially deposited on the Ni edges adjacent to the SiO2 stripes, resulting in a Cu-Ni-Cu-SiO2, Cu-SiO2-Cu, or Cu-Cu structure, depending on the dimensions of the starting Ni pattern and the deposition time. There are two reflective dips at 2.2 and 8 mu m wavelengths using Fourier transform infrared spectroscopy, which revealed a trend of narrower bandwidth in reflective spectra and a redshift effect with increasing deposition time. Interestingly, a hydrophobic surface was also observed due to its particular surface-roughness structures that could be controlled by the deposition time and altered the contact angle from 72 degrees to 110 degrees without coating any extra low free-energy materials. (C) 2008 American Vacuum Society.en_US
dc.language.isoen_USen_US
dc.titleFabrication and properties of Cu-Ni mixed-metal periodical array for midinfrared filtering and hydrophobic applicationen_US
dc.typeArticleen_US
dc.identifier.doi10.1116/1.2975202en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.citation.volume26en_US
dc.citation.issue5en_US
dc.citation.spage1705en_US
dc.citation.epage1711en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000259874900013-
dc.citation.woscount1-
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