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dc.contributor.authorChen, Yan-Ruen_US
dc.contributor.authorKuan, Chieh-Hsiungen_US
dc.contributor.authorSuen, Yuen-Wuuen_US
dc.contributor.authorPeng, Yu-Hwaen_US
dc.contributor.authorChen, Peng-Shiuen_US
dc.contributor.authorChao, Cha-Hsinen_US
dc.contributor.authorLiang, Eih-Zheen_US
dc.contributor.authorLin, Ching-Fuhen_US
dc.contributor.authorLo, Hung-Chunen_US
dc.date.accessioned2014-12-08T15:11:02Z-
dc.date.available2014-12-08T15:11:02Z-
dc.date.issued2008-08-25en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2976549en_US
dc.identifier.urihttp://hdl.handle.net/11536/8448-
dc.description.abstractThe selective growth of high-density one-dimensional well-aligned Ge quantum dots (QDs) on the top of nanoridges patterned on Si substrate is reported. The period of ridge array is 150 nm, the width of each ridge is 80 nm, and the depth of the trench is 20 nm. The areal density of QDs is about 5.4 x 10(9) cm(-2). Simulations of the chemical potential show that a proper distribution of the surface curvature may give rise to a suitable chemical potential minimum helping positioning the QDs. These ridges can also be used to control the shape and the uniformity of QDs. (C) 2008 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleHigh-density one-dimensional well-aligned germanium quantum dots on a nanoridge arrayen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2976549en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume93en_US
dc.citation.issue8en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000259011900065-
dc.citation.woscount6-
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