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dc.contributor.authorChiu, C. H.en_US
dc.contributor.authorYen, H. H.en_US
dc.contributor.authorChao, C. L.en_US
dc.contributor.authorLi, Z. Y.en_US
dc.contributor.authorYu, Peichenen_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorWang, S. C.en_US
dc.contributor.authorLau, K. M.en_US
dc.contributor.authorCheng, S. J.en_US
dc.date.accessioned2014-12-08T15:11:02Z-
dc.date.available2014-12-08T15:11:02Z-
dc.date.issued2008-08-25en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2969062en_US
dc.identifier.urihttp://hdl.handle.net/11536/8449-
dc.description.abstractHigh efficiency GaN-based light-emitting diodes (LEDs) are demonstrated by a nanoscale epitaxial lateral overgrowth (NELO) method on a SiO(2) nanorod-array patterned sapphire substrate (NAPSS). The transmission electron microscopy images suggest that the voids between SiO(2) nanorods and the stacking faults introduced during the NELO of GaN can effectively suppress the threading dislocation density. The output power and external quantum efficiency of the fabricated LED were enhanced by 52% and 56%, respectively, compared to those of a conventional LED. The improvements originated from both the enhanced light extraction assisted by the NAPSS and the reduced dislocation densities using the NELO method. (C) 2008 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleNanoscale epitaxial lateral overgrowth of GaN-based light-emitting diodes on a SiO(2) nanorod-array patterned sapphire templateen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2969062en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume93en_US
dc.citation.issue8en_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000259011900008-
dc.citation.woscount67-
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