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dc.contributor.authorChuang, Wei-Chingen_US
dc.contributor.authorLee, An-Chenen_US
dc.contributor.authorHo, Chi-Tingen_US
dc.date.accessioned2014-12-08T15:11:07Z-
dc.date.available2014-12-08T15:11:07Z-
dc.date.issued2008-08-01en_US
dc.identifier.issn0030-4018en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.optcom.2008.04.019en_US
dc.identifier.urihttp://hdl.handle.net/11536/8519-
dc.description.abstractA procedure for fabricating a high aspect ratio periodic structure on a UV polymer at submicron order using holographic interferometry and molding;processes is described. First, holographic interferometry using a He-Cd (325 nm) laser was used to create the master of the periodic line structure on an i-line sub-micron positive photoresist film. A 20 nm nickel thin film was then sputtered on the photoresist. The final line pattern on a UV polymer was obtained from casting against the master mold. Finally, a SU8 polymer was spun on the polymer grating; to form a planar waveguide or a channel waveguide. The measurement results show that the waveguide length could be reduced for the waveguide having gratings with a high aspect ratio. (c) 2008 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectholographic interferometryen_US
dc.subjectoptical fabricationen_US
dc.subjectdiffraction gratingsen_US
dc.subjectmolden_US
dc.subjectpolymeric wavelength filtersen_US
dc.titleUsing a micro-molding process to fabricate polymeric wavelength filtersen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.optcom.2008.04.019en_US
dc.identifier.journalOPTICS COMMUNICATIONSen_US
dc.citation.volume281en_US
dc.citation.issue15-16en_US
dc.citation.spage3985en_US
dc.citation.epage3989en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000257364900008-
dc.citation.woscount2-
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