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dc.contributor.authorKuo, Chiung-Wenen_US
dc.contributor.authorWei, Kung Hwaen_US
dc.contributor.authorLin, Chun-Hsunen_US
dc.contributor.authorShiu, Jau-Yeen_US
dc.contributor.authorChen, Peilinen_US
dc.date.accessioned2014-12-08T15:11:16Z-
dc.date.available2014-12-08T15:11:16Z-
dc.date.issued2008-07-01en_US
dc.identifier.issn0173-0835en_US
dc.identifier.urihttp://dx.doi.org/10.1002/elps.200700943en_US
dc.identifier.urihttp://hdl.handle.net/11536/8642-
dc.description.abstractHere, we describe a simple and low-cost lithographic technique to fabricate size-controllable nanopillar arrays inside the microfluidic channels for the studies of single DNA molecules. in this approach, nanosphere lithography has been employed to grow a single layer of well-ordered close-packed colloidal crystals inside the microfluidic channels. The size of the polymeric colloidal nanoparticles could be trimmed by oxygen plasma treatment. These size-trimmed colloidal nanoparticles were then used as the etching mask in a deep etching process. As a result, well-ordered size-controllable nanopillar arrays could be fabricated inside the microfluidic channels. The gap distance between the nanopillars could be tuned between 20 and 80 nm allowing the formation of nanofluidic system where the behavi of of a single lambda-phage DNA molecule has been investigated. It was found that the lambda-phage DNA molecule could be fully stretched in the nanofluidic system formed by nanopillars with 50 nm gap distance at a field of 50 V/cm.en_US
dc.language.isoen_USen_US
dc.subjectnanofluidic systemen_US
dc.subjectnanostructuresen_US
dc.subjectsingle moleculeen_US
dc.titleNanofluidic system for the studies of single DNA moleculesen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/elps.200700943en_US
dc.identifier.journalELECTROPHORESISen_US
dc.citation.volume29en_US
dc.citation.issue14en_US
dc.citation.spage2931en_US
dc.citation.epage2938en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000258120400002-
dc.citation.woscount23-
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