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dc.contributor.authorMueller, M.en_US
dc.contributor.authorCerezo, A.en_US
dc.contributor.authorSmith, G. D. W.en_US
dc.contributor.authorChang, L.en_US
dc.contributor.authorGerstl, S. S. A.en_US
dc.date.accessioned2014-12-08T15:11:22Z-
dc.date.available2014-12-08T15:11:22Z-
dc.date.issued2008-06-09en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2918846en_US
dc.identifier.urihttp://hdl.handle.net/11536/8724-
dc.description.abstractAtom probe tomography (APT) has been used to study In(x)Ga(1-x)As quantum dots buried in GaAs. The dots have an average base width of 16.1 +/- 1.1 nm and height of 3.5 +/- 0.3 nm, but a wide range of sizes. APT composition profiles across the dots are similar to a previous study by cross-sectional scanning transmission electron microscopy, but show significant gallium incorporation (average x=0.22 +/- 0.01). The direct three-dimensional nature of the APT data also reveals the complex spatial distribution of indium within the dots. Data such as these are vital for optimizing the performance of quantum dot materials and devices. (c) 2008 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleAtomic scale characterization of buried In(x)Ga(1-x)As quantum dots using pulsed laser atom probe tomographyen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2918846en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume92en_US
dc.citation.issue23en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000256706000068-
dc.citation.woscount18-
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