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dc.contributor.authorChiu, C. H.en_US
dc.contributor.authorYu, Peichenen_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorChen, C. C.en_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorWang, S. C.en_US
dc.contributor.authorHsu, S. H.en_US
dc.contributor.authorCheng, Y. J.en_US
dc.contributor.authorChang, Y. C.en_US
dc.date.accessioned2014-12-08T15:11:22Z-
dc.date.available2014-12-08T15:11:22Z-
dc.date.issued2008-06-09en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://dx.doi.org/10.1364/OE.16.008748en_US
dc.identifier.urihttp://hdl.handle.net/11536/8726-
dc.description.abstractDisordered GaN nanopillars of three different heights: 300, 550, and 720 nm are fabricated, and demonstrate broad angular and spectral anti-reflective characteristics, up to an incident angle of 60 degrees and for the wavelength range lambda=300-1800nm. An algorithm based on a rigorous coupled-wave analysis (RCWA) method is developed to investigate the correlations between the reflective characteristics and the structural properties of the nanopillars. The broadband and omnidirectional antireflection arises mainly from the refractive-index gradient provided by nanopillars. Calculations show excellent agreement with the measured reflectivities for both s- and p-polarizations. (c) 2008 Optical Society of America.en_US
dc.language.isoen_USen_US
dc.titleBroadband and omnidirectional antireflection employing disordered GaN nanopillarsen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/OE.16.008748en_US
dc.identifier.journalOPTICS EXPRESSen_US
dc.citation.volume16en_US
dc.citation.issue12en_US
dc.citation.spage8748en_US
dc.citation.epage8754en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000256859900043-
dc.citation.woscount49-
Appears in Collections:Articles


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